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Home Ceramic PCB AMB Si3N4 Ceramic PCB 96% Substrate 80 W/MK Thermal Conductivity 100um Copper Gold Plated

AMB Si3N4 Ceramic PCB 96% Substrate 80 W/MK Thermal Conductivity 100um Copper Gold Plated


This is a single-sided ceramic PCB constructed with96% Silicon Nitride (Si3N4) ceramic substrates, using Active Metal Brazing (AMB) technology.


  • Item NO.:

    BIC-373-v402.0
  • Order(MOQ):

    1-10
  • Payment:

    T/T
  • Price Range:1 - 50/$2.9
  • Price Range:1 - 50/$99
  • Product Origin:

    China
  • Shipping Port:

    Shenzhen
  • Lead Time:

    7-10 days
  • Product Detail


AMB Si3N4 Ceramic PCB - 96% Substrate, 80 W/MK Thermal Conductivity, 100um Copper with Gold Plated

(All Ceramic PCBs are custom-manufactured. Reference images and parameters may vary based on your design requirements.)

 

Brief Introduction

This is single-sided ceramic PCB constructed with 96% Silicon Nitride (Si3N4) ceramic substrates, using Active Metal Brazing (AMB) technology. The AMB-Si3N4 ceramic circuit board has characteristics of high thermal conductivity, high insulation, high heat capacity, and a thermal expansion coefficient that matches that of the chip. This board adopts a heavy copper of 100um (2.85oz) to ensure efficient current flow. It also employ thick gold, providing a reliable connection surface for components and protecting against oxidation and wear, extending the PCB's service life. This 100um heavy copper Ceramic PCB is designed without a solder mask or silkscreen, offering maximum flexibility for customers with specific soldering or customization needs. It’s fabricated per IPC class -2 standards.


Si3N4 Ceramic PCB

 

Basic Specifications

PCB size: 42mm x 41mm=1PCS

Layer count: single sided ceramic PCB

Thickness:0.25mm

Base material: 96% Si3N4 Ceramic Substrates

Surface finish: Gold plated

Thermal conductivity of dielectric: 80 W/MK

Copper weight: 100um (2.85oz)

Gold thickness: >=1um (39.37 micro-inch)

No solder mask or silkscreen

Technology: Active Metal Brazing (AMB)

 

PCB SIZE 42 x 41mm=1PCS
BOARD TYPE
Number of Layers Double sided Ceramic PCB
Surface Mount Components YES
Through Hole Components N/A
LAYER STACKUP copper ------- 100um(2.85oz)
Si3N4 Ceramic -0.25mm
copper ------- 100um(2.85oz)
TECHNOLOGY
Minimum Trace and Space: 25mil / 25mil
Minimum / Maximum Holes: 0.5mm / 1.0mm
Number of Different Holes: 2
Number of Drill Holes: 2
Number of Milled Slots: 0
Number of Internal Cutouts: 1
Impedance Control no
BOARD MATERIAL
Glass Epoxy:  Si3N4 Ceramic -0.25mm
Final foil external:  2.85 oz
Final foil internal:  N/A
Final height of PCB:  0.3 mm ±0.1mm
PLATING AND COATING
Surface Finish Electroplated Gold (hard gold)
Solder Mask Apply To:  NO
Solder Mask Color:  NO
Solder Mask Type: N/A
CONTOUR/CUTTING Routing
MARKING
Side of Component Legend NO
Colour of Component Legend NO
Manufacturer Name or Logo:  N/A
VIA Non Plated Through Hole(NPTH)
FLAMIBILITY RATING 94 V-0
DIMENSION TOLERANCE
Outline dimension:   0.0059" (0.15mm)
Board plating: 0.0030" (0.076mm)
Drill tolerance:  0.002" (0.05mm)
TEST 100% Electrical Test prior shipment
TYPE OF ARTWORK TO BE SUPPLIED email file, Gerber RS-274-X, PCBDOC etc
SERVICE AREA Worldwide, Globally.

 

Active Metal Brazing (AMB) Technology

The AMB (Active Metal Brazing) process is a method that utilizes a small amount of active elements contained in the brazing filler metal (for example, titanium Ti) to react with the ceramic, generating a reaction layer that can be soldered by the liquid brazing filler metal, thus achieving the bonding between the ceramic and the metal.

 

Si₃N₄ (silicon nitride) ceramic substrates

Si3N4 ceramic substrates are advanced materials renowned for their exceptional mechanical, thermal, and electrical properties, making them ideal for high-performance applications.

 

The ceramic substrates are fully customizable to meet specific customer requirements, including tailored ceramic thickness,copper layer thickness, and surface treatment options.

 

Their low coefficient of thermal expansion (CTE) ranges from 2.5 to 3.1ppm/K (40-400°C), closely matching silicon and other semiconductor materials, thereby minimizing thermal stress in electronic devices. The 80 W/(m·K) thermal conductivity Ceramic material at 25°C ensures efficient heat dissipation, making them suitable for high-power and high-temperature environments.

 

Si3N4 ceramics boast an impressive bending strength of ≥700 MPa, providing exceptional mechanical strength and durability for demanding applications. It supports brazing ofcopper layers thicker than 0.8mm, reducing thermal resistance and enabling high current loads. This substrate also features selective Ag plating and sintered Ag processes, perfectly compatible with SiC chips for optimal performance.

 

1.Ceramic Parameters

Items Unit Al2O3 Si3N4
Density g/cm3 ≥3.3 ≥3.22
Roughness  (Ra) μm ≤0.6 ≤0.7
Bending strength Mpa ≥450 ≥700
Coefficient of thermal expansion 10^-6/K 4.6~5.2          (40-400℃) 2.5~3.1          (40-400℃)
Thermal conductivity W/(m*K) ≥170 (25℃) 80 (25℃)
Dielectric constant 1MHz 9 9
Dielectric loss 1MHz 2*10^-4 2*10^-4
Volume resistivity Ω*cm    >10^14 (25℃)    >10^14 (25℃)
Dielectric strength kV/mm  >20  >15


2. Material Thickness

Copper Thickness
0.15mm 0.25mm 0.30mm 0.50mm 0.8mm
Ceramic Thickness 0.25mm Si3N4 Si3N4 Si3N4 Si3N4 -
0.32mm Si3N4 Si3N4 Si3N4 Si3N4 Si3N4
0.38mm AlN AlN AlN - -
0.50mm AlN AlN AlN - -
0.63mm AlN AlN AlN - -
1.00mm AlN AlN AlN - -


Si3N4 material Ceramic PCB

 

Our PCB processing Capability

We can process precision circuits with a line width/space of 3mil/3mil and a conductor thickness of 0.5oz-14oz. We also has processing capabilities such as micro-via filling, the inorganic dam process, and 3D circuit fabrication.

 

We can handle different processing thicknesses, such as 0.25mm, 0.38mm, 0.5mm, 0.635mm, 1.0mm, 1.5mm, 2.0mm, 2.5mm, 3.0mm, etc.

 

We offer diversified surface treatments, including Electroplated gold process (1-30u"), Electroless Nickle Palladium Immersion gold process (1 - 5u"), Electroplate silver process (3 - 30um), Electroplated nickel process (3 - 10um), Immersion tin process (1 - 3um), etc

 



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